Lithography is an essential element of cleanrooms, it defines the pattern through optical or electronic resists. We dispose of 2 exposure equipments : the first, optical, has a resolution of 1µm, while the second, electronic, could reach theoretically 20nm of resolution.
One for coating wafers, with 2 spinners Delta 10 Süss Microtec, 3 integrated hot plates, and one oven drying (Oven Temperature max 200°C)
the resist available in the cleanroom are :
- For the Positive resists : S1800 series, AZ4533, AZ9260 and PMMA 950 A6.
- For the Negative resists : Az nLof 2070, SU8 series (0.5 to 100µm) and MaN2400 series
- For Image-Reversal resists, use in litf-off processes : AZ5214E, TI35ES.
Mask Aligner MJB4 simple face Süss Microtec
- Sample of 5×5 mm to 3 inches
- Mask size : 2 to 5 inches
- Spatial resolution :
- 3 microscope optics : ×5, ×10, ×18 with minimal working distance of 12mm
- Lamp intensity : about 12mW/cm2 at 365nm
(possibility of using bandpass filter around 365nm)
SEM Zeiss with Raith Elphy Quantum lithography system
The system Raith allow to control the electron beam in order to manage the exposition of electro-sensitive resists as PMMA, SU8 or MaN.
Some technical specifications :
1 hood for the development of resists
The developer available are :