Lithography is an essential element of cleanrooms, it defines the pattern through optical or electronic resists. We dispose of 2 exposure equipments : the first, optical, has a resolution of 1µm, while the second, electronic, could reach theoretically 20nm of resolution.
One for coating wafers, with 2 spinners Delta 10 Süss Microtec, 3 integrated hot plates, and one oven drying (Oven Temperature max 200°C)
the resist available in the cleanroom are :
- For the Positive resists : S1800 series, AZ4533, AZ9260 and PMMA 950 A6.
- For the Negative resists : Az nLof 2070, SU8 series (0.5 to 100µm) and MaN2400 series
- For Image-Reversal resists, use in litf-off processes : AZ5214E, TI35ES.
Mask Aligner MJB4 simple face Süss Microtec - Sample of 5×5 mm to 3 inches
- Mask size : 2 to 5 inches
- Spatial resolution :
Mask holderPhoto L. Doyennette
- 3 microscope optics : ×5, ×10, ×18 with minimal working distance of 12mm
- Lamp intensity : about 12mW/cm2 at 365nm
(possibility of using bandpass filter around 365nm)
Mask Aligner MJB4©CNRS Phototèque - C. Frésillon
SEM Zeiss with Raith Elphy Quantum lithography system
The system Raith allow to control the electron beam in order to manage the exposition of electro-sensitive resists as PMMA, SU8 or MaN.
Some technical specifications :
1 hood for the development of resists
The developer available are :
